TSI AeroTrak 9001

TSI AEROTRAK 9001 CLEANROOM CONDENSATION PARTICLE COUNTER

Unlike other high-flow-rate water-based Condensing Particle Counters, the TSI AeroTrak™ 9001 Cleanroom CPC does not use turbulent mixing. That minimises particle losses and increases count accuracy. And unlike alcohol or other non-water based CPCs, it does not introduce chemicals into cleanroom environments.

Extremely low false-count rates provide accurate 10-nanometre measurements at low particle concentrations to confidently monitor mini-environments and process gases, safeguarding manufactured products against nanoparticle contamination.

Description

 

Particle counting instruments featuring 0.1μm sensitivity will not detect nanoparticle contamination – you need a Condensation Particle Counter (CPC) with 10-nanometre resolution specifically designed for ultra-clean manufacturing environments such as those found in semiconductor production and wafer fabrication. These are contamination-controlled spaces where real-time nanoparticle detection is critical in air and inert pressurised gas applications.

The TSI AeroTrak 9001 Cleanroom Condensation Particle Counter delivers real-time 10nm sensitivity. In addition, it is the only water-based, laminar flow, high-flow-rate instrument on the market. It does not use turbulent mixing and eliminates the risks of introducing alcohol and other non-water-based chemicals into your pristine cleanroom to provide the confidence you need to monitor critical cleanroom environments to the highest standards. Using patented technology, the TSI AeroTrak 9001 Cleanroom Condensation Particle Counter provides 10nm sensitivity at a 0.1 CFM (2.83 L/min) flow rate. With an ultra-low false count rate, minimised particle losses and increased particle count accuracy, it is ideally suited to the low particle concentrations found in ISO Class 1 and Class 2 cleanroom environments, and is the optimum solution at the heart of an effective contamination control strategy.

 

Applications

  • Tracking down nanoscale particle contamination sources (10nm < 100nm)
  • Semiconductor manufacturing
  • Wafer fab applications
  • Graphene materials processing
  • Process improvement
  • Monitoring ultra-clean areas
  • Looking for filter leaks
  • Conducting indoor air quality investigations

 

 

 

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